Water-developable photosensitive resin composition
US6140017A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1998 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | Mar 10, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/108
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A water-developable photosensitive resin composition which comprises: PA1 (1) a particulate copolymer comprising, as recurring units in the copolymer, (a) 10 to 95 mole % of an aliphatic conjugated diene unit, (b) 0.1 to 30 mole % of a monomer unit having at least one polymerizable unsaturated group and at least one functional group selected from the group consisting of carboxyl group, amino group, hydroxyl group, epoxy group, sulfonic acid group and phosphoric acid group, and (c) 0.1 to 20 mole % of a monomer unit having at least two polymerizable unsaturated groups; PA1 (2) at least one copolymer selected from the group consisting of (i) a block-like copolymer composed of two or more polymeric segments having a sulfonic acid group in at least one of the polymeric segments, (ii) a block-like copolymer composed of two or more polymeric segments having a polyurethane segment in at least one of the polymeric segments, and (iii) a copolymer of ethylene and an .alpha.-olefin having 3 to 20 carbon atoms; PA1 (3) a photopolymerizable unsaturated compound; and PA1 (4) a photopolymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.