Hologram and process for producing hologram
US6141123A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 28, 1999 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | May 28, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2270/23
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a hologram with excellent heat resistance. The hologram comprises a hologram film (10) in which a diffraction grating has been recorded, a substrate (11) situated on one side of the hologram film (10) via a bonding material (13), and a polymer film (12) situated on the other side of the hologram film (10) via a bonding material (13), wherein the thickness of the polymer film (12) is no greater than 100 .mu.m. Otherwise, the polymer film (12) is subjected to prior heat treatment. There is further provided a production process for holograms with minimal appearance defects. The process comprises preparing a photopolymer (210) coated onto a substrate (211) and affixing the photopolymer surface (301) onto a photographed object original (213), exposing it to laser light to converting it into a hologram (201), then releasing the hologram (201) from the photographed object original (213) to expose the hologram surface (302) and finally affixing a protective film (215) onto the hologram surface (302), such that the bonding strength A between the substrate (211) and the hologram (201) is greater than the bonding strength B between the hologram (201) and the protective film …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.