Curable composition for back-protecting material in making shadow mask
US6143803A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1999 |
| Grant date | Nov 7, 2000 |
| Priority date | — |
| Expiry date | Jun 23, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D4/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a curable composition for back-protecting material used in making shadow masks which gives a cured film excellent in all of etching resistance, alkali solubility or peelability, and pattern formability even when a second etching is carried out at high temperatures. That is, the present invention provides a curable composition for back-protecting material used at a second etching step in making shadow masks which comprises the following components (a), (b) and (c) and which gives a cured film having alkali solubility or alkali peelability: PA1 (a) a compound having one carboxyl group and one (meth)acryloyl group, PA1 (b) a tri(meth)acrylate of an alkylene oxide adduct of isocyanuric acid, and PA1 (c) (c1) a (meth)acrylate compound having two or more (meth)acryloyl groups, (c2) a chain transfer agent, or a combination of (c1) and (c2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.