Apparatus for electron beam physical vapor deposition
US6145470A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 1998 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Dec 11, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/246
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing a ceramic coating by electron beam physical vapor deposition (EBPVD). Ceramic coatings of more uniform thickness over a larger surface area are deposited by increasing the size of a pool of molten ceramic from which the ceramic is deposited. The apparatus uses a crucible that surrounds a ceramic material that serves as the source of the deposited ceramic coating. The crucible is configured to define a reservoir whose cross-sectional area is larger than the cross-sectional area of the ceramic material. The size of the pool is increased by increasing the size of the reservoir in lieu of increasing the diameter of the ceramic material in order to maintain acceptable ingot quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.