Sputtering method for producing layered aluminium fine particles and use thereof
US6146505A · kind A · utility
5Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 1998 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Feb 11, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2993
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a method for producing layered aluminum fine particles, and applications to single electron tunneling quantum devices, and the present invention further relates to a method for producing spherical metallic aluminum fine particles (layered aluminum fine particles), characterized in that metallic aluminum is supplied into a mixed gas of helium and 1.times.10.sup.-7 to 3.times.10.sup.-7 torr water vapor by sputtering induced by argon gas discharge to generate aggregates, after which this product is released into a vacuum to generate single crystals in which the surface layer is covered with alumina.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.