Patent · US Expired

Method of and apparatus for masking a master for reproduction

US6146817A · kind A · utility

1Cited by

20References

32Claims

0Family size

Assignee

Agfa-Gevaert NV · BE

Inventors

Wolfgang Zahn
Friedrich Jacob · Munich, DE
Gunter Findeis · Sauerlach, DE

Key dates

Filing date	Jun 7, 1995
Grant date	Nov 14, 2000
Priority date	—
Expiry date	Jun 7, 2015

Classification

Technology area (CPC G)Physics
CPC primaryG03B27/735
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A negative to be printed is masked. The mask, or an image of the mask in the plane of the negative, or both the mask and the image, have a low resolution of 0.1 to 2 line pairs per millimeter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.