Detecting trace levels of copper
US6146909A · kind A · utility
1Cited by
0References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1998 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Nov 21, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0095
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The specification describes an analytical technique for determining trace levels of copper in a background matrix of titanium by dissolving the titanium and the copper impurity in HF, then selectively depositing the copper on a clean silicon surface. The silicon surface is then analyzed for the trace level of copper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.