Method and apparatus for incremental concurrent learning in automatic semiconductor wafer and liquid crystal display defect classification
US6148099A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 1997 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Jul 3, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An incremental concurrent learning method starts with providing potential defects and fabrication information and a primary classification rule and secondary classification rule selection from a knowledge defect database from multiple products with different process cycles. The method then performs a truth inquiry to update a classification rule database for use by the primary classification rule and secondary classification rule selection. The method performs a primary defect classification and checks the confidence of the classification, and performs a secondary defect classification if the confidence is not high. If the confidence of the secondary defect classification is not high, a new defect may have been discovered and a novelty defect detection step is performed to define artifacts or potential new defect types to provide information for the truth inquiry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.