Plasma processing apparatus
US6148762A · kind A · utility
24Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1999 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | Feb 8, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma processing apparatus for stably and uniformly performing various kinds of processing by preventing unnecessary plasma discharge in the processing comprises a susceptor pin for supporting a substance to be processed, the susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole, and a guide for guiding the rising and falling directions of the susceptor pin, wherein the susceptor pin and the guide are composed of ceramics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.