Quartz glass component used in the production of semiconductors
US6150006A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1998 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | Nov 24, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24355
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A quartz glass component for use in the manufacture of semiconductors is provided. It has a rough surface which is formed by irregular elevated structural elements which extend between a first, higher plane and a second, lower plane. A plurality of the structural elements has a substantially flat top surface extending in the first plane. This surface is bounded on all sides by facet-like, substantially flat, side surfaces which extend between the first and the second planes. The average surface roughness depth R.sub.a lies between 0.1 .mu.m and 10 .mu.m and the size of the structural elements ranges on average between 30 .mu.m and 180 .mu.m. The invention provides a quartz glass component particularly suitable for the adhesion of CVD layers and having a long service life.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.