Photonic device having an integal guide and method of manufacturing
US6151430A · kind A · utility
27Cited by
11References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 1998 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | Jul 8, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/423
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process is provided for creating microstructure coupling guides for aligning photonic devices with optical signal carrying apparatuses. The process includes applying a photoresist to a semiconductor material, spinning the semiconductor material, baking the semiconductor material, exposing the photoresist, baking the semiconductor material a second time, and developing the resist. The process creates a microstructure that acts as an integral guide to align and maintain the relative position between an optical signal carrying apparatus and a photonic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.