Flow control apparatus for a semiconductor manufacturing wet bench
US6152818A · kind A · utility
4Cited by
19References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1999 |
| Grant date | Nov 28, 2000 |
| Priority date | — |
| Expiry date | Feb 10, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67075
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus for controlling the volume of air that is supplied and exhausted from a electronic semiconductor manufacturing wet bench is disclosed. The volume of air that is exhausted from the wet bench is increased during predetermined portions of the manufacturing process and is reduced during noncritical times as a function of predetermined conditions that may be detected or otherwise determined during the manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.