Apparatus for vaporizing and supplying a material
US6155540A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1998 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Sep 23, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for vaporizing a liquid material and supplying the material in a gas phase, in which a liquid material for CVD is introduced into a vaporizer at a controlled flow rate, atomized by an ultrasonic atomizing device disposed at the inside or the outside of the vaporizer, heated by a circular flow of a carrier gas and vaporized. When a liquid material for CVD is supplied to a CVD apparatus in the production of semiconductors, the concentration of the material is controlled easily in the vaporization, the concentration of the material in the gas can be changed quickly in response with the change in the flow rate of the material, decomposition of the material does not occur and the operating condition of a CVD apparatus is not restricted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.