Apparatus for the application of an advanced texture process
US6155914A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 18, 1998 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Sep 18, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B21/004
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.