Method and apparatus for improving the performance of an aperture monitoring system
US6157024A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 1999 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Jun 3, 2019 |
Classification
- Technology area (CPC E)Fixed Constructions
- CPC primaryE05Y2900/55
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A monitoring system for use in detecting the presence of an obstacle in or proximate to an aperture. Materials are applied to one or more reflecting surfaces adjacent the aperture, enabling the improvement of the signal-to-noise ratio in the system without requiring tuning the system for the particular environment. The choice of specific material depends upon the type of radiation used for aperture monitoring and whether an obstacle is detected as an increase or decrease in reflected radiation. A calibration LED within the monitoring system enables predictable performance over a range of temperatures. The monitoring system is also provided with the capacity to adjust to variations in the background-reflected radiation, either automatically by monitoring trends in system performance or by external command. The latter case includes the use of a further element for communicating to the monitoring system directly or indirectly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.