Method and system for on-line monitoring plasma chamber condition by comparing intensity of certain wavelength
US6157867A · kind A · utility
42Cited by
10References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 27, 1998 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Feb 27, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/24042
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method for operating a plasma processing system comprises the following steps. Produce a plasma in a plasma processing chamber operating upon a selected workpiece. Perform in situ detection of electromagnetic radiation of a certain wavelength generated in the plasma in the plasma processing chamber. Calculate a first intensity difference of the certain wavelength from a set point of intensity. Halt production of the plasma in the plasma processing chamber if the first intensity difference is outside of specifications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.