Plasma processing method and apparatus
US6158383A · kind A · utility
278Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1999 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Apr 2, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32284
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma processing method and apparatus, microwaves are radiated from a slot antenna set at the bottom of a resonator, a plasma is generated using the microwave and a sample is processed by the plasma. A plasma having a ring-form is generated by the microwaves radiated from the slot antennas, which are disposed at an angle which is neither in parallel to nor perpendicular to a surface current flowing on a slot antenna plate. Thereby, the sample is uniformly processed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.