Patent · US Expired

Colloidal silica polishing abrasive

US6159077A · kind A · utility

3Cited by
4References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 30, 1999
Grant dateDec 12, 2000
Priority date
Expiry dateJul 30, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2993
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses in the finishing industry. The colloidal silica by product is referred to as "soot". Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal candidate for polishing applications. The soot has a large particle size when compared to conventional colloidal or fumed silica. As a result, the large size produces less surface damage and allows for a higher (faster) removal rate. The large particle size also results in super polished surfaces.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.