Magnetron sputtering apparatus and mask
US6159350A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1995 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Jan 11, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/851
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A magnetron sputtering apparatus for forming a thin metal film on one of the major surfaces of a light-transmitting disc-shaped substrate as a disc substrate for an optical disc as mutually intersecting magnetic fields are applied by a magnetic field application unit provided at back of a target. The apparatus includes a center mask tightly contacted with the outer peripheral portion of one major surface of the disc substrate on which the thin film is formed for masking the center portion of the substrate and an outer peripheral mask tightly contacted with the outer peripheral portion of the one major surface of the disc substrate on which the thin film is formed for masking the outer peripheral portion. The outer peripheral mask is separated from and independent of the center mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.