Patent · US Expired

Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound

US6159673A · kind A · utility

15Cited by
0References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 20, 1999
Grant dateDec 12, 2000
Priority date
Expiry dateJan 20, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09B23/083
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

An oxonol compound is represented by the following formula (I): ##STR1## in which Z is an atomic group that forms a cyclic amide ring; each of W.sup.1 and W.sup.2 independently is an atomic group that forms an acidic nucleus ring; and M is a cation. Other oxonol compounds, a light-sensitive material containing an oxonol compound and a process for the synthesis of an oxonol compound are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.