Oxonol compound, light-sensitive material and process for the synthesis of oxonol compound
US6159673A · kind A · utility
15Cited by
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22Claims
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Key dates
| Filing date | Jan 20, 1999 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Jan 20, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09B23/083
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An oxonol compound is represented by the following formula (I): ##STR1## in which Z is an atomic group that forms a cyclic amide ring; each of W.sup.1 and W.sup.2 independently is an atomic group that forms an acidic nucleus ring; and M is a cation. Other oxonol compounds, a light-sensitive material containing an oxonol compound and a process for the synthesis of an oxonol compound are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.