Low residue aqueous hard surface cleaning and disinfecting compositions
US6159924A · kind A · utility
42Cited by
20References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1999 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Jul 9, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D1/75
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system, one or more amine oxides, one or more nonionic alkylpolyglycosides, water and optionally further conventional additives including pH buffers, dyes, fragrances and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.