Cell control method and apparatus
US6161054A · kind A · utility
97Cited by
13References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 17, 1998 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Sep 17, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An implementation of sensor-driven run-to-run process control for semiconductor wafer fabrication integrates a robust, automated Fourier transform infrared reflectometer onto a wafer fabrication cluster tool. Cell controller software integrates an adaptive run-to-run controller, process tool recipe upload and download through a SECS port, sensor control, data archiving, and a graphical user interface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.