Method and apparatus for variably controlling the temperature in a selective deposition modeling environment
US6162378A · kind A · utility
144Cited by
11References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 25, 1999 |
| Grant date | Dec 19, 2000 |
| Priority date | — |
| Expiry date | Feb 25, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2037/90
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method, system and apparatus for variably controlling the temperature in a selective deposition modeling environment. The temperature of the formed portion of the three-dimensional object is detected. A gas is forced onto a surface of the formed portion of the three-dimensional object. The forced gas has a characteristic, such as temperature and quantity, that is variably controlled based on the detected temperature of the formed portion of the three-dimensional object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.