Method for closed loop control of chemical vapor deposition process
US6162488A · kind A · utility
65Cited by
21References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 1997 |
| Grant date | Dec 19, 2000 |
| Priority date | — |
| Expiry date | May 14, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is directed to a method of controlling the application of a surface coating by chemical deposition using a closed loop control on growth rate. The method compares a measure of growth rate against a setpoint for the growth rate and adjusts a primary input parameter in order to drive/maintain the measure of growth rate equal to the setpoint.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.