Mask blank and method of producing mask
US6162564A · kind A · utility
5Cited by
20References
17Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Nov 25, 1997 |
| Grant date | Dec 19, 2000 |
| Priority date | — |
| Expiry date | Nov 25, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A shading film of chrome is formed entirely on one surface of a circular substrate of quartz. The substrate is rotated and resist is applied to the shading film. Since the substrate is shaped in a circle, the resist spreads uniformly on the entire surface of the shading film by the centrifugal force. Therefore, the resist has a substantially uniform film thickness over almost the entire surface of the shading film. This resist is patterned to form a resist pattern. By etching the shading film with the resist pattern used as a mask, a pattern preferable in accuracy of dimensions can be formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.