Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof
US6165682A · kind A · utility
23Cited by
4References
24Claims
0Family size
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Key dates
| Filing date | Sep 22, 1999 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Sep 22, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: ##STR1## and optionally, ##STR2## wherein n is an integer of 1 to 5, R.sup.1 is methyl or trimethylsiloxy, R.sup.2 is a tert-butyl group, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen or a methyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.