Method of fabricating of structures by metastable atom impact desorption of a passivating layer
US6165688A · kind A · utility
14Cited by
13References
19Claims
0Family size
Assignee
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Key dates
| Filing date | May 12, 1997 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | May 12, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H3/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A metastable depassivation lithography process for fabricating microstructures on a surface which utilizes the energy contained in neutral metastable rare gas atoms to remove passivating atoms from selected areas of a surface. Removal of the passivating atoms in a pattern allows further chemical processing to add or remove material to the exposed areas. The neutral metastable rare gas atoms can be directed to the surface using atom optical techniques to effect a desired pattern of exposure by the atoms. Alternatively, a mask can be used to effect a desired pattern of exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.