Base film for photographic films
US6165701A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1997 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Nov 14, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A base film for photographic films formed from a copolyester comprising 97 to 100 mol % of 2,6-naphthalenedicarboxylic acid and 0 to 3 mol % of a dicarboxylic acid other than 2,6-naphthalenedicarboxylic acid and (i) 87 to 99.8 mol % of ethylene glycol, 0.2 to 10 mol % of bis[4-(.omega.-hydroxyalkoxy)phenyl]sulfone and 0 to 3 mol % of a glycol other than ethylene glycol and bis[4-(.omega.-hydroxyalkoxy)phenyl]sulfone or (ii) 97 to 100 mol % of ethylene glycol, 0 to 3 mol % of a diol other than ethylene glycol and 1 to 7 mol % of an oxycarboxylic acid. This base film has an endothermic peak having a peak top temperature, measured by a differential scanning calorimeter, of 120 to 160.degree. C. and showing an endothermic energy of 0.3 mJ/mg or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.