Method for manufacturing a capacitor
US6165832A · kind A · utility
3Cited by
1References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 1999 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Jun 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01G4/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a capacitor includes the step of depositing metal thin film layers and resin layers alternating with each other, thereby forming a layered product. The thickness of the resin layer and the metal thin film or the width of margins are measured during the deposition. At a predetermined point in the process of the deposition, the number of layers to be deposited further is determined, based on the measured values and an intended electrostatic capacitance or deposition thickness. The thus obtained capacitor has the intended electrostatic capacitance or deposition thickness with a small dispersion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.