Laser interferometric lithographic system providing automatic change of fringe spacing
US6166820A · kind A · utility
3Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 1998 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | May 18, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.