Double side cleaning apparatus for semiconductor substrate
US6167583A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 1998 |
| Grant date | Jan 2, 2001 |
| Priority date | — |
| Expiry date | May 14, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/34
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A double side cleaning apparatus includes a pair of roll-like brushes and at least one cleaning brush. The roll-like brushes are driven to rotate in opposite directions, and a semiconductor wafer is arranged between them in a non-contact manner. The cleaning brush is arranged near the pair of roll-like brushes. While the semiconductor wafer is arranged between the pair of roll-like brushes and its upper and lower surfaces are being cleaned, the cleaning brush brushes the side surface of the semiconductor wafer. A cleaning agent is supplied from the pair of roll-like brushes to the semiconductor wafer to clean it. Since the upper and lower surfaces of the semiconductor wafer are cleaned in a non-contact manner, dust can be removed efficiently (within a short period of time and a small space).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.