Method of casting patterned dielectric structures
US6168737A · kind A · utility
25Cited by
29References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 23, 1998 |
| Grant date | Jan 2, 2001 |
| Priority date | — |
| Expiry date | Feb 23, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/864
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A pattern of dielectric structures are formed directly on a substrate in a single step using sol-gel chemistry and molding procedures. The resulting dielectric structures are useful in vacuum applications for electronic devices. Porous, lightweight structures having a high aspect ratio that are suitable for use as spacers between the faceplate and baseplate of a field emission display can be manufactured using this method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.