Beam deflector and scanner
US6169594A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1998 |
| Grant date | Jan 2, 2001 |
| Priority date | — |
| Expiry date | Aug 24, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/141
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A beam deflector comprising a pair of mated microprism arrays with one of the arrays comprised of a variable refractive index material capable of being selectively changed in response to a field whose magnitude or intensity is regulated by regulating voltage applied. The other array preferably is comprised of a material having a constant refractive index. A conductive layer is disposed on both sides of the variable refractive index array. A pane preferably is disposed in front and behind the arrays. Two pairs of the arrays can be arranged parallel to each other with their microprisms generally perpendicular forming a two-dimensional deflector. To achieve a deflection response time faster than 100 .mu.s, each prism has a height no larger than about 20 .mu.m and a width preferably no greater than about 100 .mu.m. Preferably, each prism height is less than about 15 to about 10 .mu.m to achieve a response time 30 .mu.s or faster. A method of making the deflector includes using direct-write electron beam lithography to make a master for replicating arrays having a height of 10 .mu.m or less. A pair of deflectors can be used to deflect a beam in two dimensions and can be used in a scanne…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.