Vacuum drying of semiconductor fragments

US6170171A · kind A · utility

Assignee

• Wacker Chemie AG · DE

Inventors

• Wilhelm Schmidbauer · Emmerting, DE
• Hanns Wochner · Burghausen, DE
• Werner Ott · Hülben, DE

Key dates

• Filing date: Dec 8, 1998
• Grant date: Jan 9, 2001
• Expiry date: Dec 8, 2018

Classification

• Technology area (CPC F): Mechanical Engineering; Lighting; Heating
• CPC primary: F26B5/04
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method and apparatus for drying semiconductor fragment material, has at least one vacuum-tight chamber with at least one receiving means for semiconductor fragment material, and there is a means for maintaining a vacuum in the apparatus.