Ceramics dress substrate and method of using the dress substrate
US6176769A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Dec 22, 1998 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Dec 22, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/252
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A ceramics dress substrate of the present invention capable of both performances of cutting a cut material with a high accuracy and dressing a diamond cutting grindstone with an excellent cutting property and an reduced wearing amount of the grindstone. This ceramics dress substrate comprises sintering a mixture of ceramics grinding particles and a silicate mineral, The ceramics grinding particles are preferably uniformed and have a scratch hardness ranging from 6 to 10. Alumina grinding particles, silicon carbide and mullite are preferably used as the ceramics grinding particles, and a kaolin mineral, pyrophyllite, montmorillonite, sericite, talc and chlorite are preferably used as the silicate mineral. The ceramics dress substrate is preferably coated with glass.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.