Thin film deposition apparatus
US6176932A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 12, 1999 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Feb 12, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/85
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for manufacturing information recording disks is disclosed. The apparatus includes a deposition chamber for providing an undercoat layer to a substrate to be treated, a deposition chamber for providing a magnetic recording layer on the substrate, a deposition chamber for providing a protective layer over the recording layer and a holding chamber for removing the resulting information recording disk upon completion of the process steps. The deposition chamber which provides the protective layer includes a system which selectively introduces heated plasma and oxygen into the interior of the deposition chamber to clean the interior surfaces of the chamber while the apparatus is in use. The heated plasma and oxygen interact with any excess protective layer material, resulting in the formation of a gas which is removed from the interior of the deposition chamber by a pumping system. The holding chamber is used to remove and maintain the processed information recording disk while the interior of the deposition chamber is being cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.