Process for coating substrates with a silicium-containing layer
US6177136A · kind A · utility
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9References
18Claims
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Key dates
| Filing date | Feb 26, 1999 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Feb 26, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for coating substrates with a silicon-containing protective layer by chemical vapor deposition with a silicon-containing compound of the structural formula (1): ##STR1## in which PA1 R.sup.1 is an alkyl group having 1 to 4 carbon atoms, and PA1 R.sup.2 is hydrogen or an alkyl group having 1 to 4 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.