Patent · US Expired

Process for coating substrates with a silicium-containing layer

US6177136A · kind A · utility

0Cited by
9References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 26, 1999
Grant dateJan 23, 2001
Priority date
Expiry dateFeb 26, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T50/60
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process for coating substrates with a silicon-containing protective layer by chemical vapor deposition with a silicon-containing compound of the structural formula (1): ##STR1## in which PA1 R.sup.1 is an alkyl group having 1 to 4 carbon atoms, and PA1 R.sup.2 is hydrogen or an alkyl group having 1 to 4 carbon atoms.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.