Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process

US6177148A · kind A · utility

Assignee

• Carl Zeiss Stiftung · DE

Inventors

• Marten Walther · Engelstadt, DE
• Wolfgang Mohl · Worms, DE
• Burkhard Danielzik · Ingelheim am Rhein, DE
• Markus Kuhr · Wollstein, DE
• Roland Hochhaus · Mainz, DE
• Hartmut Bauch · Ober-Olm, DE
• Martin Heming · Saulheim, DE
• Thomas Kupper · Zürich, CH
• Lars Bewig · Bad Gandersheim, DE

Key dates

• Filing date: May 10, 1999
• Grant date: Jan 23, 2001
• Expiry date: May 10, 2019

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/545
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.