Method for making flexible circuits
US6177357A · kind A · utility
9Cited by
8References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 30, 1999 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Apr 30, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/0793
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using a UV-curable 100% active liquid photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50.degree. C. to about 120.degree. C., and then stripping the resist off the polymeric film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.