Monolithic symmetric interferometer for generation of variable-periodicity patterns for lithography
US6178000A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 8, 1998 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Jul 8, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An interferometer device includes a first prism portion and a second prism portion. The first prism portion has a semi-transparent surface, a beam incident surface and a beam emerging surface. The beam incident surface receives an incident light beam at a wavelength of .lambda. and at an angle of incidence .theta. with respect to a normal to the beam incident surface. The second prism portion has a surface that corresponds to the semi-transparent surface of the first prism portion and a beam emerging surface that corresponds to the beam emerging surface of the first prism portion. The first and second prism portions are attached to each other at the semi-transparent surface of the first prism portion and the surface of the second prism portion corresponding to the semi-transparent surface. The semi-transparent surface splits the incident light beam into first and second light beams by reflecting the first beam at the semi-transparent surface and by passing the second light beam through the semi-transparent surface so that the second light beam enters the second prism portion. The first and second light beams are each respectively reflected internally to the first and second prism p…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.