Radiation absorbing polymer and synthesis thereof
US6184305A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 1998 |
| Grant date | Feb 6, 2001 |
| Priority date | — |
| Expiry date | May 15, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A radiation absorbing polymer is characterized by having a main chain copolymer containing recurring units of dicarboxylic acid or carboxylic anhydride group with an organic chromophore bonded to the carboxyl group through methylene or alkylene linkage group, where the organic chromophore is bonded to the carboxyl group by esterification reaction. Residual carboxyl groups of the radiation absorbing polymer can optionally be amidized and/or imidized with an aromatic compounds having a reactive amino group. When the photoresist is applied on the antireflective coating and is exposed by radiation such as deep ultraviolet radiation, a resist pattern with high resolving power is formed, which is not affected by standing wave upon manufacturing integrated circuit elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.