Exposure apparatus and image formation apparatus
US6184971A · kind A · utility
11Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 1998 |
| Grant date | Feb 6, 2001 |
| Priority date | — |
| Expiry date | Sep 21, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/40087
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A high-quality image is formed by using light emission element arrays of plural lines. The plural light emission element arrays are arranged substantially in parallel, an area of a light emission part of each array being different from others, respective light emission elements in the light emission element arrays are caused to selectively perform light emission according to gradation data, and the respective light emission element arrays overlappingly perform exposure on a relatively moved photosensitive body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.