Method for fabrication of multi-step structures using embedded etch stop layers
US6187211A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 1998 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Dec 15, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabrication is provided for multi-step microlithographic structures including Fresnel lenses whereby the process includes the formation of intermediate etch stop layers that are embedded with the structure material. This is accomplished in one aspect of the invention by depositing Fresnel lens material using known techniques and the selectively altering the chemistry of the material being deposited to form the intermediate etch stop layers at suitable positions without interrupting the deposition process. In another aspect, etch stop layers are patterned on layers of the lens material and embedded between such layers. The structure, or lens, is then formed using masking, patterning and etching techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.