Radiation sensitive resin composition
US6187504A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1997 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Nov 24, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): ##STR1## wherein R.sup.1, R.sup.2, R.sup.5, and R.sup.6 are an alkyl group, R.sup.3 and R.sup.7 are a hydroxyl group or --OR.sup.4 (wherein R.sup.4 is an organic group), A.sub.1.sup.- and A.sub.2.sup.- indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.