Process for forming mask pattern and process for producing thin film magnetic head
US6187513A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 21, 1999 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | May 21, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/3996
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
It is to provide a process for forming a mask pattern and a process for producing a thin film magnetic head, in which burr is not formed on removing a resist. The process for forming a mask pattern comprises a first coating step of coating a first resist on a surface, on which the mask pattern is formed; a first exposure step of forming a pattern latent image by exposing the first resist; a second coating step of coating a second resist on the first resist; a second exposure step of forming a pattern latent image by exposing the second resist; a first development step of forming an upper layer mask pattern by developing the second resist; and a second development step of forming a lower layer mask pattern by developing the first resist, the upper layer mask pattern having a resist bridge part, and a space being present between the resist bridge part and the surface, on which the mask pattern is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.