Method of oxidizing nitride material enhanced by illumination with UV light at room temperature
US6190508A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 1999 |
| Grant date | Feb 20, 2001 |
| Priority date | — |
| Expiry date | Apr 7, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2002/72
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming oxide from nitride, in which the oxidation is enhanced by illuminating the nitride material with UV light. This method produces a rapid growth of oxide and allows for the monitoring of the oxide thickness in situ. The method comprises the steps of (i) placing the nitride material on an illuminating holder; (ii) dipping the nitride material and the illuminating holder in an electrolyte; and (iii) illuminating the nitride material with a light having an energy larger than the energy gap of the nitride material. The nitride material can be connected to a conductive electrode located in the electrolyte via a galvanometer to monitor a photo current generated by the oxidation of the nitride material so as to monitor the thickness of the oxide formed on the nitride material in situ. A metal coating can be coated on the nitride material to define the oxide forming region. The pH value of the electrolyte is in a range of approximately 3 to 10, and is preferably about 3.5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.