Method and apparatus for fault detection and control
US6192287A · kind A · utility
26Cited by
5References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1998 |
| Grant date | Feb 20, 2001 |
| Priority date | — |
| Expiry date | Sep 22, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A fault detection and classification system for wafer etching, tool cleaning, and other fabrication processes employs exhaust gas composition data from a Fourier transform infrared spectrometer in addition to machine-state and other process-state data. Process control may be initiated based upon the classification of a fault.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.