Patent · US Expired

Shadow mask manufacturing method, shadow mask manufacturing apparatus, and cleaning device used in the method and apparatus

US6193897A · kind A · utility

3Cited by
8References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 2, 1997
Grant dateFeb 27, 2001
Priority date
Expiry dateJul 2, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2209/017
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A shadow mask manufacturing method comprising the cleaning step performs rapid cleaning by spraying a cleaning solution, which is inert with respect to the band-like thin metal plate, upon upper and lower surfaces of the band-like thin metal plate and thereby generating cavitation near the surfaces of the band-like thin metal plate by using cavitation jet means, while regulating a position of the band-like thin metal plate and preventing the cleaning solution from leaking in a direction opposite to the conveyance direction of the band-like thin metal plate by using a first leakage-preventing seal unit provided upstream the cavitation jet means.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.