Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel
US6194826A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 1998 |
| Grant date | Feb 27, 2001 |
| Priority date | — |
| Expiry date | Mar 11, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/2271
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of: PA0 (I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness, PA0 (II) irradiating a scattered light to the layer (A) imagewisely, PA0 (III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and PA0 (IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern, a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.