Patent · US Expired

Method for preparing light-absorbing polymeric compositions

US6197223A · kind A · utility

23Cited by
108References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 26, 1999
Grant dateMar 6, 2001
Priority date
Expiry dateMay 26, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09B69/109
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The present invention recites a method comprising reacting in a solvent in the presence of a base PA1 a) at least one diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1200 nm and 99-0 mole % of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm, with PA1 b) an organic compound of Formula II EQU X--B--X.sub.1 PA2 wherein B is a divalent organic radical to form a light absorbing composition comprising a mixture of a polymer having the formula ##STR1## and a cyclic compound having the general formula ##STR2## wherein B is as defined above; n is at least 2, m is 1, 2, 3 or 4 and A comprises the residue of a diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1000 nm and wherein the remaining portion of A comprises the residue of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.